Inicio > GARCIA GARCIA, HECTOR

GARCIA GARCIA, HECTOR

PROFESORES TITULARES DE UNIVERSIDAD
Electricidad y Electrónica
GRUPO DE CARACTERIZACIÓN DE MATERIALES Y DISPOSITIVOS ELECTRÓNICOS ( ELECTRONIC MATERIALS AND DEVICES CHARACTERIZATION GROUP, GCME)
 
hecgar@ele.uva.es
0

Índice H en Web of Science: 14
Índice H en Scopus: 15
 
Enlazar esta página

[][com.sigma.fs3.argos.domain.gpc.GpcArticlesRev[id=com.sigma.fs3.argos.domain.gpc.GpcArticlesRevPK[ifcactivitat=ARE, ifccomptador=55346]], camposKey:1938-6737 2020-01-01 Current and Voltage Control of Intermediate States in Bipolar Rram Devices for Neuristor Applications1720, com.sigma.fs3.argos.domain.gpc.GpcArticlesRev[id=com.sigma.fs3.argos.domain.gpc.GpcArticlesRevPK[ifcactivitat=ARE, ifccomptador=57061]], camposKey:2168-6734 2020-01-01 Current Pulses to Control the Conductance in RRAM Devices291296, com.sigma.fs3.argos.domain.gpc.GpcArticlesRev[id=com.sigma.fs3.argos.domain.gpc.GpcArticlesRevPK[ifcactivitat=ARE, ifccomptador=55347]], camposKey:1938-6737 2020-01-01 Double Swing Quiescent-Current: An Experimental Detection Method of Ferroelectricity in Very Leaky Dielectric Films36, com.sigma.fs3.argos.domain.gpc.GpcArticlesRev[id=com.sigma.fs3.argos.domain.gpc.GpcArticlesRevPK[ifcactivitat=ARE, ifccomptador=57159]], camposKey:2168-6734 2020-01-01 Programming Pulse Width Assessment for Reliable and Low-Energy Endurance Performance in Al:HfO2-Based RRAM Arrays00, com.sigma.fs3.argos.domain.gpc.GpcArticlesRev[id=com.sigma.fs3.argos.domain.gpc.GpcArticlesRevPK[ifcactivitat=ARE, ifccomptador=52709]], camposKey:0167-9317 2019-01-01 Control of the set and reset voltage polarity in anti-series and anti-parallel resistive switching structures00, com.sigma.fs3.argos.domain.gpc.GpcArticlesRev[id=com.sigma.fs3.argos.domain.gpc.GpcArticlesRevPK[ifcactivitat=ARE, ifccomptador=52710]], camposKey:0167-9317 2019-01-01 Controlling the intermediate conductance states in RRAM devices for synaptic applications00, com.sigma.fs3.argos.domain.gpc.GpcArticlesRev[id=com.sigma.fs3.argos.domain.gpc.GpcArticlesRevPK[ifcactivitat=ARE, ifccomptador=52708]], camposKey:0167-9317 2019-01-01 Dynamics of set and reset processes on resistive switching memories00, com.sigma.fs3.argos.domain.gpc.GpcArticlesRev[id=com.sigma.fs3.argos.domain.gpc.GpcArticlesRevPK[ifcactivitat=ARE, ifccomptador=52711]], camposKey:0021-8979 2018-01-01 Analysis and control of the intermediate memory states of RRAM devices by means of admittance parameters00, com.sigma.fs3.argos.domain.gpc.GpcArticlesRev[id=com.sigma.fs3.argos.domain.gpc.GpcArticlesRevPK[ifcactivitat=ARE, ifccomptador=11939]], camposKey:2190-4286 2018-01-01 Atomic layer deposition and properties of ZrO2/Fe2O3 thin films119128, com.sigma.fs3.argos.domain.gpc.GpcArticlesRev[id=com.sigma.fs3.argos.domain.gpc.GpcArticlesRevPK[ifcactivitat=ARE, ifccomptador=40100]], camposKey:0361-5235 2018-01-01 Electrical Characterization of Defects Created by gamma-Radiation in HfO2-Based MIS Structures for RRAM Applications50135018, com.sigma.fs3.argos.domain.gpc.GpcArticlesRev[id=com.sigma.fs3.argos.domain.gpc.GpcArticlesRevPK[ifcactivitat=ARE, ifccomptador=40101]], camposKey:0361-5235 2018-01-01 Energy Levels of Defects Created in Silicon Supersaturated with Transition Metals49934997, com.sigma.fs3.argos.domain.gpc.GpcArticlesRev[id=com.sigma.fs3.argos.domain.gpc.GpcArticlesRevPK[ifcactivitat=ARE, ifccomptador=11079]], camposKey:0361-5235 2018-01-01 The Role of Defects in the Resistive Switching Behavior of Ta2O5-TiO2-Based Metal Insulator Metal (MIM) Devices for Memory Applications49384943, com.sigma.fs3.argos.domain.gpc.GpcArticlesRev[id=com.sigma.fs3.argos.domain.gpc.GpcArticlesRevPK[ifcactivitat=ARE, ifccomptador=3787]], camposKey:0167-9317 2017-06-25 A physically based model for resistive memories including a detailed temperature and variability description2629, com.sigma.fs3.argos.domain.gpc.GpcArticlesRev[id=com.sigma.fs3.argos.domain.gpc.GpcArticlesRevPK[ifcactivitat=ARE, ifccomptador=39977]], camposKey:2163-4971 2017-01-01 A Physically Based Model to describe Resistive Switching in different RRAM technologies00, com.sigma.fs3.argos.domain.gpc.GpcArticlesRev[id=com.sigma.fs3.argos.domain.gpc.GpcArticlesRevPK[ifcactivitat=ARE, ifccomptador=39976]], camposKey:2163-4971 2017-01-01 Advanced electrical characterization of atomic layer deposited Al2O3 MIS-based structures00, com.sigma.fs3.argos.domain.gpc.GpcArticlesRev[id=com.sigma.fs3.argos.domain.gpc.GpcArticlesRevPK[ifcactivitat=ARE, ifccomptador=3785]], camposKey:0741-3106 2017-01-01 Experimental observation of negative susceptance in HfO2-based RRAM devices12161219, com.sigma.fs3.argos.domain.gpc.GpcArticlesRev[id=com.sigma.fs3.argos.domain.gpc.GpcArticlesRevPK[ifcactivitat=ARE, ifccomptador=3786]], camposKey:0167-9317 2017-01-01 Study of the admittance hysteresis cycles in TiN/Ti/HfO2/W-based RRAM devices3033, com.sigma.fs3.argos.domain.gpc.GpcArticlesRev[id=com.sigma.fs3.argos.domain.gpc.GpcArticlesRevPK[ifcactivitat=ARE, ifccomptador=3789]], camposKey:0018-9383 2016-05-01 Study from cryogenic to high temperatures of the high- and low-resistance-state currents of ReRAM Ni-HfO2-Si capacitors18771883, com.sigma.fs3.argos.domain.gpc.GpcArticlesRev[id=com.sigma.fs3.argos.domain.gpc.GpcArticlesRevPK[ifcactivitat=ARE, ifccomptador=11942]], camposKey:1938-5862 2016-01-01 A complete suite of experimental techniques for electrical characterization of conventional and incoming high-k dielectric-based devices153165, com.sigma.fs3.argos.domain.gpc.GpcArticlesRev[id=com.sigma.fs3.argos.domain.gpc.GpcArticlesRevPK[ifcactivitat=ARE, ifccomptador=11941]], camposKey:0160-8371 2016-01-01 Advances towards 4J lattice-matched including dilute nitride subcell for terrestrial and space applications5257, com.sigma.fs3.argos.domain.gpc.GpcArticlesRev[id=com.sigma.fs3.argos.domain.gpc.GpcArticlesRevPK[ifcactivitat=ARE, ifccomptador=3788]], camposKey:1931-7573 2016-01-01 Electrical Characterization of Amorphous Silicon MIS-Based Structures for HIT Solar Cell Applications00, com.sigma.fs3.argos.domain.gpc.GpcArticlesRev[id=com.sigma.fs3.argos.domain.gpc.GpcArticlesRevPK[ifcactivitat=ARE, ifccomptador=11080]], camposKey:1938-5862 2016-01-01 Electrical properties and nanoresistive switching of Ni-HfO2-Si capacitors335342, com.sigma.fs3.argos.domain.gpc.GpcArticlesRev[id=com.sigma.fs3.argos.domain.gpc.GpcArticlesRevPK[ifcactivitat=ARE, ifccomptador=3790]], camposKey:0021-8979 2015-12-30 A detailed analysis of the energy levels configuration existing in the band gap of supersaturated silicon with titanium for photovoltaic applications00, com.sigma.fs3.argos.domain.gpc.GpcArticlesRev[id=com.sigma.fs3.argos.domain.gpc.GpcArticlesRevPK[ifcactivitat=ARE, ifccomptador=3791]], camposKey:0167-9317 2015-11-01 Charge and current hysteresis in dysprosium-doped zirconium oxide thin films5558, com.sigma.fs3.argos.domain.gpc.GpcArticlesRev[id=com.sigma.fs3.argos.domain.gpc.GpcArticlesRevPK[ifcactivitat=ARE, ifccomptador=3792]], camposKey:2166-2746 2015-05-01 Hole trap distribution on 2 MeV electron irradiated high-k dielectrics00, com.sigma.fs3.argos.domain.gpc.GpcArticlesRev[id=com.sigma.fs3.argos.domain.gpc.GpcArticlesRevPK[ifcactivitat=ARE, ifccomptador=3793]], camposKey:0268-1242 2015-03-01 Characterization of deep level defects present in mono-like, quasi-mono and multicrystalline silicon solar substrates00, com.sigma.fs3.argos.domain.gpc.GpcArticlesRev[id=com.sigma.fs3.argos.domain.gpc.GpcArticlesRevPK[ifcactivitat=ARE, ifccomptador=3794]], camposKey:0268-1242 2015-03-01 Scavenging effect on plasma oxidized Gd2O3 grown by high pressure sputtering on Si and InP substrates00, com.sigma.fs3.argos.domain.gpc.GpcArticlesRev[id=com.sigma.fs3.argos.domain.gpc.GpcArticlesRevPK[ifcactivitat=ARE, ifccomptador=3797]], camposKey:0948-1907 2015-01-01 Atomic layer deposition and characterization of dysprosium-doped zirconium oxide thin films181187, com.sigma.fs3.argos.domain.gpc.GpcArticlesRev[id=com.sigma.fs3.argos.domain.gpc.GpcArticlesRevPK[ifcactivitat=ARE, ifccomptador=3796]], camposKey:0040-6090 2015-01-01 Conduction and stability of holmium titanium oxide thin films grown by atomic layer deposition5559, com.sigma.fs3.argos.domain.gpc.GpcArticlesRev[id=com.sigma.fs3.argos.domain.gpc.GpcArticlesRevPK[ifcactivitat=ARE, ifccomptador=6958]], camposKey:2163-4971 2015-01-01 Electrical characterization of MIS capacitors based on Dy2O3-doped ZrO2 dielectrics230, com.sigma.fs3.argos.domain.gpc.GpcArticlesRev[id=com.sigma.fs3.argos.domain.gpc.GpcArticlesRevPK[ifcactivitat=ARE, ifccomptador=3795]], camposKey:0003-6951 2015-01-01 Energy levels distribution in supersaturated silicon with titanium for photovoltaic applications00, com.sigma.fs3.argos.domain.gpc.GpcArticlesRev[id=com.sigma.fs3.argos.domain.gpc.GpcArticlesRevPK[ifcactivitat=ARE, ifccomptador=3799]], camposKey:0026-2714 2014-01-01 Single-parameter model for the post-breakdown conduction characteristics of HoTiOx-based MIM capacitors17071711, com.sigma.fs3.argos.domain.gpc.GpcArticlesRev[id=com.sigma.fs3.argos.domain.gpc.GpcArticlesRevPK[ifcactivitat=ARE, ifccomptador=3800]], camposKey:0268-1242 2013-05-10 Influence of growth and annealing temperatures on the electrical properties of Nb2O5-based MIM capacitors00, com.sigma.fs3.argos.domain.gpc.GpcArticlesRev[id=com.sigma.fs3.argos.domain.gpc.GpcArticlesRevPK[ifcactivitat=ARE, ifccomptador=3801]], camposKey:0040-6090 2013-05-01 2 MeV electron irradiation effects on bulk and interface of atomic layer deposited high-k gate dielectrics on silicon482487, com.sigma.fs3.argos.domain.gpc.GpcArticlesRev[id=com.sigma.fs3.argos.domain.gpc.GpcArticlesRevPK[ifcactivitat=ARE, ifccomptador=3802]], camposKey:0021-8979 2013-01-14 Experimental verification of intermediate band formation on titanium-implanted silicon00, com.sigma.fs3.argos.domain.gpc.GpcArticlesRev[id=com.sigma.fs3.argos.domain.gpc.GpcArticlesRevPK[ifcactivitat=ARE, ifccomptador=6954]], camposKey:2163-4971 2013-01-01 Deep level defects on mono-like and polycrystalline silicon solar cells313316, com.sigma.fs3.argos.domain.gpc.GpcArticlesRev[id=com.sigma.fs3.argos.domain.gpc.GpcArticlesRevPK[ifcactivitat=ARE, ifccomptador=3804]], camposKey:0734-2101 2013-01-01 Electrical characterization of atomic-layer-deposited hafnium oxide films from hafnium tetrakis(dimethylamide) and water/ozone: Effects of growth temperature, oxygen source, and postdeposition annealing00, com.sigma.fs3.argos.domain.gpc.GpcArticlesRev[id=com.sigma.fs3.argos.domain.gpc.GpcArticlesRevPK[ifcactivitat=ARE, ifccomptador=6963]], camposKey:2163-4971 2013-01-01 Electrical study of ScO-based MIS structures using Al and Ti as gate electrodes285288, com.sigma.fs3.argos.domain.gpc.GpcArticlesRev[id=com.sigma.fs3.argos.domain.gpc.GpcArticlesRevPK[ifcactivitat=ARE, ifccomptador=3803]], camposKey:2166-2746 2013-01-01 Interface quality of Sc2O3 and Gd2O 3 films based metal-insulator-silicon structures using Al, Pt, and Ti gates: Effect of buffer layers and scavenging electrodes00, com.sigma.fs3.argos.domain.gpc.GpcArticlesRev[id=com.sigma.fs3.argos.domain.gpc.GpcArticlesRevPK[ifcactivitat=ARE, ifccomptador=6952]], camposKey:2163-4971 2013-01-01 Photocurrent measurements for solar cells characterization349352, com.sigma.fs3.argos.domain.gpc.GpcArticlesRev[id=com.sigma.fs3.argos.domain.gpc.GpcArticlesRevPK[ifcactivitat=ARE, ifccomptador=6953]], camposKey:2163-4971 2013-01-01 The role of defects in solar cells: Control and detection Defects in solar cells301304, com.sigma.fs3.argos.domain.gpc.GpcArticlesRev[id=com.sigma.fs3.argos.domain.gpc.GpcArticlesRevPK[ifcactivitat=ARE, ifccomptador=3805]], camposKey:0038-1101 2013-01-01 2 MeV electron irradiation effects on the electrical characteristics of metal-oxide-silicon capacitors with atomic layer deposited Al2O 3, HfO2 and nanolaminated dielectrics6574, com.sigma.fs3.argos.domain.gpc.GpcArticlesRev[id=com.sigma.fs3.argos.domain.gpc.GpcArticlesRevPK[ifcactivitat=ARE, ifccomptador=6961]], camposKey:0094-243X 2012-01-01 Electrical Properties of Intermediate Band (IB) Silicon Solar Cells Obtained by Titanium Ion Implantation189192, com.sigma.fs3.argos.domain.gpc.GpcArticlesRev[id=com.sigma.fs3.argos.domain.gpc.GpcArticlesRevPK[ifcactivitat=ARE, ifccomptador=3806]], camposKey:0040-6090 2011-01-31 Electrical characterization of high-pressure reactive sputtered ScO x films on silicon22682272, com.sigma.fs3.argos.domain.gpc.GpcArticlesRev[id=com.sigma.fs3.argos.domain.gpc.GpcArticlesRevPK[ifcactivitat=ARE, ifccomptador=3808]], camposKey:2166-2746 2011-01-01 Electrical characteristics of metal-insulator-semiconductor structures with atomic layer deposited Al2 O3, HfO2, and nanolaminates on different silicon substrates00, com.sigma.fs3.argos.domain.gpc.GpcArticlesRev[id=com.sigma.fs3.argos.domain.gpc.GpcArticlesRevPK[ifcactivitat=ARE, ifccomptador=3807]], camposKey:2166-2746 2011-01-01 Electrical characterization of high-k based metal-insulator-semiconductor structures with negative resistance effect when using Al2O 3 and nanolaminated films deposited on p-Si00, com.sigma.fs3.argos.domain.gpc.GpcArticlesRev[id=com.sigma.fs3.argos.domain.gpc.GpcArticlesRevPK[ifcactivitat=ARE, ifccomptador=6962]], camposKey:1938-5862 2011-01-01 Electron Irradiation Effects on Atomic Layer Deposited High-k Gate Dielectrics349359, com.sigma.fs3.argos.domain.gpc.GpcArticlesRev[id=com.sigma.fs3.argos.domain.gpc.GpcArticlesRevPK[ifcactivitat=ARE, ifccomptador=3809]], camposKey:2166-2746 2011-01-01 Influence of precursor chemistry and growth temperature on the electrical properties of SrTiO3 -based metal-insulator-metal capacitors grown by atomic layer deposition00, com.sigma.fs3.argos.domain.gpc.GpcArticlesRev[id=com.sigma.fs3.argos.domain.gpc.GpcArticlesRevPK[ifcactivitat=ARE, ifccomptador=3810]], camposKey:0021-8979 2010-06-01 Effect of interlayer trapping and detrapping on the determination of interface state densities on high-k dielectric stacks00, com.sigma.fs3.argos.domain.gpc.GpcArticlesRev[id=com.sigma.fs3.argos.domain.gpc.GpcArticlesRevPK[ifcactivitat=ARE, ifccomptador=6964]], camposKey:1938-5862 2010-01-01 Electrical characterization of high-pressure reactive sputtered Sc2O3 films on silicon287297, com.sigma.fs3.argos.domain.gpc.GpcArticlesRev[id=com.sigma.fs3.argos.domain.gpc.GpcArticlesRevPK[ifcactivitat=ARE, ifccomptador=3811]], camposKey:0167-9317 2009-07-01 Comparison between the electrical properties of atomic layer deposited thin ZrO2 films processed from cyclopentadienyl precursors16891691, com.sigma.fs3.argos.domain.gpc.GpcArticlesRev[id=com.sigma.fs3.argos.domain.gpc.GpcArticlesRevPK[ifcactivitat=ARE, ifccomptador=3812]], camposKey:1071-1023 2009-02-19 Irradiation effect on dielectric properties of hafnium and gadolinium oxide gate dielectrics416420, com.sigma.fs3.argos.domain.gpc.GpcArticlesRev[id=com.sigma.fs3.argos.domain.gpc.GpcArticlesRevPK[ifcactivitat=ARE, ifccomptador=3813]], camposKey:1071-1023 2009-02-17 Electrical properties of thin zirconium and hafnium oxide high-k gate dielectrics grown by atomic layer deposition from cyclopentadienyl and ozone precursors389393, com.sigma.fs3.argos.domain.gpc.GpcArticlesRev[id=com.sigma.fs3.argos.domain.gpc.GpcArticlesRevPK[ifcactivitat=ARE, ifccomptador=3814]], camposKey:0021-8979 2008-11-25 Influence of interlayer trapping and detrapping mechanisms on the electrical characterization of hafnium oxide/silicon nitride stacks on silicon00, com.sigma.fs3.argos.domain.gpc.GpcArticlesRev[id=com.sigma.fs3.argos.domain.gpc.GpcArticlesRevPK[ifcactivitat=ARE, ifccomptador=3815]], camposKey:0013-4651 2008-10-01 Comparative study of flatband voltage transients on high-k dielectric-based metal-insulator-semiconductor capacitors00, com.sigma.fs3.argos.domain.gpc.GpcArticlesRev[id=com.sigma.fs3.argos.domain.gpc.GpcArticlesRevPK[ifcactivitat=ARE, ifccomptador=3817]], camposKey:0022-3093 2008-01-15 Identification of spatial localization and energetic position of electrically active defects in amorphous high-k dielectrics for advanced devices393398, com.sigma.fs3.argos.domain.gpc.GpcArticlesRev[id=com.sigma.fs3.argos.domain.gpc.GpcArticlesRevPK[ifcactivitat=ARE, ifccomptador=3816]], camposKey:0022-3093 2008-01-15 Selection of post-growth treatment parameters for atomic layer deposition of structurally disordered TiO2 thin films404408, com.sigma.fs3.argos.domain.gpc.GpcArticlesRev[id=com.sigma.fs3.argos.domain.gpc.GpcArticlesRevPK[ifcactivitat=ARE, ifccomptador=3818]], camposKey:0268-1242 2007-12-01 Electrical properties of high-pressure reactive sputtered thin hafnium oxide high-k gate dielectrics13441351, com.sigma.fs3.argos.domain.gpc.GpcArticlesRev[id=com.sigma.fs3.argos.domain.gpc.GpcArticlesRevPK[ifcactivitat=ARE, ifccomptador=3819]], camposKey:0013-4651 2007-08-31 Electrical properties of atomic-layer-deposited thin gadolinium oxide high- k gate dielectrics00, com.sigma.fs3.argos.domain.gpc.GpcArticlesRev[id=com.sigma.fs3.argos.domain.gpc.GpcArticlesRevPK[ifcactivitat=ARE, ifccomptador=3820]], camposKey:0026-2714 2007-04-01 Experimental observations of temperature-dependent flat band voltage transients on high-k dielectrics653656, com.sigma.fs3.argos.domain.gpc.GpcArticlesRev[id=com.sigma.fs3.argos.domain.gpc.GpcArticlesRevPK[ifcactivitat=ARE, ifccomptador=3821]], camposKey:0021-8979 2006-11-23 Experimental investigation of the electrical properties of atomic layer deposited hafnium-rich silicate films on n-type silicon00, com.sigma.fs3.argos.domain.gpc.GpcArticlesRev[id=com.sigma.fs3.argos.domain.gpc.GpcArticlesRevPK[ifcactivitat=ARE, ifccomptador=3822]], camposKey:0021-8979 2006-03-01 Influence of single and double deposition temperatures on the interface quality of atomic layer deposited Al2O3 dielectric thin films on silicon00, com.sigma.fs3.argos.domain.gpc.GpcArticlesRev[id=com.sigma.fs3.argos.domain.gpc.GpcArticlesRevPK[ifcactivitat=ARE, ifccomptador=8947]], camposKey:1568-2609 2006-01-01 Disordered structure and density of gap states in high-permittivity thin solid films1230, com.sigma.fs3.argos.domain.gpc.GpcArticlesRev[id=com.sigma.fs3.argos.domain.gpc.GpcArticlesRevPK[ifcactivitat=ARE, ifccomptador=8946]], camposKey:1568-2609 2006-01-01 Electrical defects in atomic layer deposited HfO2 films on silicon: Influence of precursor chemistries and substrate treatment2870, com.sigma.fs3.argos.domain.gpc.GpcArticlesRev[id=com.sigma.fs3.argos.domain.gpc.GpcArticlesRevPK[ifcactivitat=ARE, ifccomptador=3823]], camposKey:0268-1242 2005-10-01 A comparative study of the electrical properties of TiO2 films grown by high-pressure reactive sputtering and atomic layer deposition10441051, com.sigma.fs3.argos.domain.gpc.GpcArticlesRev[id=com.sigma.fs3.argos.domain.gpc.GpcArticlesRevPK[ifcactivitat=ARE, ifccomptador=3824]], camposKey:0026-2714 2005-05-01 Electrical characterization of hafnium oxide and hafnium-rich silicate films grown by atomic layer deposition949952, com.sigma.fs3.argos.domain.gpc.GpcArticlesRev[id=com.sigma.fs3.argos.domain.gpc.GpcArticlesRevPK[ifcactivitat=ARE, ifccomptador=3825]], camposKey:0040-6090 2005-03-01 Comparative study on electrical properties of atomic layer deposited high-permittivity materials on silicon substrates222229, com.sigma.fs3.argos.domain.gpc.GpcArticlesRev[id=com.sigma.fs3.argos.domain.gpc.GpcArticlesRevPK[ifcactivitat=ARE, ifccomptador=5370]], camposKey:0026-2714 2005-01-01 ON THE INFLUENCE OF SUBSTRATE CLEANING METHOD AND RAPID THERMAL ANNEALING CONDITIONS ON THE ELECTRICAL CHARACTERISTICS OF AL/SINX/SIO2/SI FABRICATED BY ECR-CVD978981, com.sigma.fs3.argos.domain.gpc.GpcArticlesRev[id=com.sigma.fs3.argos.domain.gpc.GpcArticlesRevPK[ifcactivitat=ARE, ifccomptador=3826]], camposKey:0268-1242 2004-09-01 The electrical-interface quality of as-grown atomic-layer-deposited disordered HfO2 on p- and n-type silicon11411148, com.sigma.fs3.argos.domain.gpc.GpcArticlesRev[id=com.sigma.fs3.argos.domain.gpc.GpcArticlesRevPK[ifcactivitat=ARE, ifccomptador=3827]], camposKey:0021-8979 2004-08-01 Effect of growth temperature and postmetallization annealing on the interface and dielectric quality of atomic layer deposited HfO2 on p and n silicon13651372, com.sigma.fs3.argos.domain.gpc.GpcArticlesRev[id=com.sigma.fs3.argos.domain.gpc.GpcArticlesRevPK[ifcactivitat=ARE, ifccomptador=6960]], camposKey:0272-9172 2004-01-01 On the interface quality of MIS structures fabricated from atomic layer deposition of HfO2,Ta2O5 and Nb2O5-Ta2O5-Nb2O5 dielectric thin films147152, com.sigma.fs3.argos.domain.gpc.GpcArticlesRev[id=com.sigma.fs3.argos.domain.gpc.GpcArticlesRevPK[ifcactivitat=ARE, ifccomptador=5382]], camposKey:0272-9172 2003-01-01 On the interface quality of MIS structures fabricated from Atomic Layer Deposition of HfO2, Ta2O5 and Nb2O5¿Ta2O5¿Nb2O5 dielectric thin films00][CapitolsLlib{id=com.sigma.fs3.argos.domain.gpc.GpcCapitolsLlibPK[ifcactivitat=CAP, ifccomptador=21718]},camposKey: 165 178 RRAM memories with ALD high-k dielectrics: electrical characterization and analytical modelling. Thin Film Processes - Artifacts on Surface Phenomena and Technological Facets 1 2017-01-01 Intech, CapitolsLlib{id=com.sigma.fs3.argos.domain.gpc.GpcCapitolsLlibPK[ifcactivitat=CAP, ifccomptador=21716]},camposKey: Resistive Switching Behavior and Electrical Properties of TiO2:Ho2O3 and HoTiOx Based MIM Capacitors Materials for End-of-Roadmap Devices in Logic, Power and Memory. Materials Research Society Symposium Proceedings 1 2014-01-01 Vogel, CapitolsLlib{id=com.sigma.fs3.argos.domain.gpc.GpcCapitolsLlibPK[ifcactivitat=CAP, ifccomptador=1859]},camposKey: 313 316 Deep level defects on mono-like and polycrystalline silicon solar cells 2012 International Symposium on Telecommunication Technologies (ISTT) 26-28 Nov. 2012, Kuala Lumpur, Malaysia 1 2013-01-01 Piscataway, CapitolsLlib{id=com.sigma.fs3.argos.domain.gpc.GpcCapitolsLlibPK[ifcactivitat=CAP, ifccomptador=1865]},camposKey: 285 288 Electrical study of ScO-based MIS structures using Al and Ti as gate electrodes 2012 International Symposium on Telecommunication Technologies (ISTT) 26-28 Nov. 2012, Kuala Lumpur, Malaysia 1 2013-01-01 Piscataway, CapitolsLlib{id=com.sigma.fs3.argos.domain.gpc.GpcCapitolsLlibPK[ifcactivitat=CAP, ifccomptador=1857]},camposKey: 349 352 Photocurrent measurements for solar cells characterization 2012 International Symposium on Telecommunication Technologies (ISTT) 26-28 Nov. 2012, Kuala Lumpur, Malaysia 1 2013-01-01 Piscataway, CapitolsLlib{id=com.sigma.fs3.argos.domain.gpc.GpcCapitolsLlibPK[ifcactivitat=CAP, ifccomptador=1858]},camposKey: 301 304 The role of defects in solar cells: Control and detection Defects in solar cells 2012 International Symposium on Telecommunication Technologies (ISTT) 26-28 Nov. 2012, Kuala Lumpur, Malaysia 1 2013-01-01 Piscataway, CapitolsLlib{id=com.sigma.fs3.argos.domain.gpc.GpcCapitolsLlibPK[ifcactivitat=CAP, ifccomptador=21519]},camposKey: Electrical Characterization of High-K Dielectric Gates for Microelectronic Devices Dielectric Material 1 2012-01-01 IntechOpen, CapitolsLlib{id=com.sigma.fs3.argos.domain.gpc.GpcCapitolsLlibPK[ifcactivitat=CAP, ifccomptador=21688]},camposKey: A study of tunneling assisted charge exchange on the inner interface of high-k dielectrics s tacks 2011 Spanish Conference on Electron Devices Proceedings 1 2011-01-01 IEEE, CapitolsLlib{id=com.sigma.fs3.argos.domain.gpc.GpcCapitolsLlibPK[ifcactivitat=CAP, ifccomptador=21687]},camposKey: Characterization of SrTiO3-based MIM capacitors grown by using different precursors and growth temperatures 2011 Spanish Conference on Electron Devices Proceedings 1 2011-01-01 IEEE, CapitolsLlib{id=com.sigma.fs3.argos.domain.gpc.GpcCapitolsLlibPK[ifcactivitat=CAP, ifccomptador=1864]},camposKey: 349 359 Electron Irradiation Effects on Atomic Layer Deposited High-k Gate Dielectrics - 1 2011-01-01 -, CapitolsLlib{id=com.sigma.fs3.argos.domain.gpc.GpcCapitolsLlibPK[ifcactivitat=CAP, ifccomptador=21689]},camposKey: Negative-resistance effect in Al2O3 based and nanolaminated MIS structures 2011 Spanish Conference on Electron Devices Proceedings 1 2011-01-01 IEEE, CapitolsLlib{id=com.sigma.fs3.argos.domain.gpc.GpcCapitolsLlibPK[ifcactivitat=CAP, ifccomptador=1066]},camposKey: 1 4 Effect of interlayer trapping and detrapping on the determination of interface state densities on high-k dielectric stacks 2009 Spanish Conference on Electron Devices 1 2009-01-01 IEEE, CapitolsLlib{id=com.sigma.fs3.argos.domain.gpc.GpcCapitolsLlibPK[ifcactivitat=CAP, ifccomptador=1063]},camposKey: 223 226 Electrical characterization of high-k based MIS capacitors using flat-band voltage transients 2009 Spanish Conference on Electron Devices 1 2009-01-01 IEEE, CapitolsLlib{id=com.sigma.fs3.argos.domain.gpc.GpcCapitolsLlibPK[ifcactivitat=CAP, ifccomptador=1070]},camposKey: 227 230 Electrical characterization of ZrO2-based MIS structures with highly doped Si substrates 2009 Spanish Conference on Electron Devices 1 2009-01-01 IEEE, CapitolsLlib{id=com.sigma.fs3.argos.domain.gpc.GpcCapitolsLlibPK[ifcactivitat=CAP, ifccomptador=1079]},camposKey: 8 11 Study of Atomic Layer Deposited Zirconium Oxide Thin Films by Using Mono-Cyclopentadienyl Based Precursors 2009 Spanish Conference on Electron Devices 1 2009-01-01 IEEE, CapitolsLlib{id=com.sigma.fs3.argos.domain.gpc.GpcCapitolsLlibPK[ifcactivitat=CAP, ifccomptador=21706]},camposKey: Electrical characterization of high-k dielectrics by means of flat-band voltage transients recording Characterization of Oxide/Semiconductor Interfaces for Cmos Technologies (Materials Research Society Symposium Proceedings) 1 2008-01-01 Curran Associates Inc, CapitolsLlib{id=com.sigma.fs3.argos.domain.gpc.GpcCapitolsLlibPK[ifcactivitat=CAP, ifccomptador=21707]},camposKey: Study of Atomic Layer Deposited Gadolinium Oxide Thin Films on Silicon Characterization of Oxide/Semiconductor Interfaces for Cmos Technologies (Materials Research Society Symposium Proceedings) 1 2008-01-01 Curran Associates Inc, CapitolsLlib{id=com.sigma.fs3.argos.domain.gpc.GpcCapitolsLlibPK[ifcactivitat=CAP, ifccomptador=2062]},camposKey: 123 134 Disordered structure and density of gap states in high-permittivity thin solid films Defects in HIgh-k Gate Dielectric Stacks 1 2006-01-27 -, CapitolsLlib{id=com.sigma.fs3.argos.domain.gpc.GpcCapitolsLlibPK[ifcactivitat=CAP, ifccomptador=2061]},camposKey: 287 298 Electrical defects in atomic layer deposited HfO2 films on silicon: Influence of precursor chemistries and substrate treatment Defects in HIgh-k Gate Dielectric Stacks 1 2006-01-27 -, CapitolsLlib{id=com.sigma.fs3.argos.domain.gpc.GpcCapitolsLlibPK[ifcactivitat=CAP, ifccomptador=21655]},camposKey: 41 63 Electrical characterization of high-k gate dielectrics New Materials and Processes for Incoming Semiconudors Technologies 1 2006-01-01 Transworld Research Network, CapitolsLlib{id=com.sigma.fs3.argos.domain.gpc.GpcCapitolsLlibPK[ifcactivitat=CAP, ifccomptador=2063]},camposKey: 29 32 A comparative study of atomic layer deposited advanced high-k dielectrics 2005 Spanish Conference on Electron Devices 1 2005-01-01 IEEE, CapitolsLlib{id=com.sigma.fs3.argos.domain.gpc.GpcCapitolsLlibPK[ifcactivitat=CAP, ifccomptador=2064]},camposKey: 45 48 Electrical characterization of atomic-layer-depo sited hafnium silicate for alternative gate dielectric application 2005 Spanish Conference on Electron Devices 1 2005-01-01 IEEE, CapitolsLlib{id=com.sigma.fs3.argos.domain.gpc.GpcCapitolsLlibPK[ifcactivitat=CAP, ifccomptador=2065]},camposKey: 49 52 Interface quality of high-pressure reactive sputtered and atomic layer deposited titanium oxide thin films on silicon 2005 Spanish Conference on Electron Devices 1 2005-01-01 IEEE, CapitolsLlib{id=com.sigma.fs3.argos.domain.gpc.GpcCapitolsLlibPK[ifcactivitat=CAP, ifccomptador=1863]},camposKey: 147 152 On the interface quality of MIS structures fabricated from atomic layer deposition of HfO2,Ta2O5 and Nb2O5-Ta2O5-Nb2O5 dielectric thin films Fundamentals of novel oxide/semiconductor interfaces 1 2004-03-01 -, CapitolsLlib{id=com.sigma.fs3.argos.domain.gpc.GpcCapitolsLlibPK[ifcactivitat=CAP, ifccomptador=21653]},camposKey: A study of the quality of MIS structures based on hafnium and zirconium oxide grown by Atomic Layer Deposition Actas de la 4ª Conferencia de Dispositivos Electrónicos 1 2003-01-01 Instituto de Microelectrónica de Barcelona][][Llibres{id=com.sigma.fs3.argos.domain.gpc.GpcLlibresPK[ifcactivitat=LLI, ifccomptador=117174],camposKey=Using current pulses to control the intermediate conductance states in hafnium oxide-based RRAM devices 1 2020-01-01 IEEE}][][][][][][][][com.sigma.fs3.argos.domain.gpc.GpcTesis[id=com.sigma.fs3.argos.domain.gpc.GpcTesisPK[ifcactivitat=TES, ifccomptador=2145637285]]][][][][][][][][com.sigma.investigacion.cawdos.utilidades.CongresoYSusAsociaciones@52f56e10, com.sigma.investigacion.cawdos.utilidades.CongresoYSusAsociaciones@6f0d06fc, com.sigma.investigacion.cawdos.utilidades.CongresoYSusAsociaciones@4045c359, com.sigma.investigacion.cawdos.utilidades.CongresoYSusAsociaciones@241c2906, com.sigma.investigacion.cawdos.utilidades.CongresoYSusAsociaciones@34c95b6f, com.sigma.investigacion.cawdos.utilidades.CongresoYSusAsociaciones@f91ef7c][][][][][][][][][][com.sigma.investigacion.cawdos.entities.ayudaInvestigacion.ProjectesPPC[id=com.sigma.fs3.argos.domain.gpc.ayudasrecerca.ProjectesPPCId@45f93f], com.sigma.investigacion.cawdos.entities.ayudaInvestigacion.ProjectesPPC[id=com.sigma.fs3.argos.domain.gpc.ayudasrecerca.ProjectesPPCId@45f744], com.sigma.investigacion.cawdos.entities.ayudaInvestigacion.ProjectesPPC[id=com.sigma.fs3.argos.domain.gpc.ayudasrecerca.ProjectesPPCId@412ee3], com.sigma.investigacion.cawdos.entities.ayudaInvestigacion.ProjectesPPC[id=com.sigma.fs3.argos.domain.gpc.ayudasrecerca.ProjectesPPCId@41258c], com.sigma.investigacion.cawdos.entities.ayudaInvestigacion.ProjectesPPC[id=com.sigma.fs3.argos.domain.gpc.ayudasrecerca.ProjectesPPCId@412f0e], com.sigma.investigacion.cawdos.entities.ayudaInvestigacion.ProjectesPPC[id=com.sigma.fs3.argos.domain.gpc.ayudasrecerca.ProjectesPPCId@460872], com.sigma.investigacion.cawdos.entities.ayudaInvestigacion.ProjectesPPC[id=com.sigma.fs3.argos.domain.gpc.ayudasrecerca.ProjectesPPCId@412350]][][][][]

AYUDA A LA INVESTIGACIÓN

PUBLICACIONES

Artículos de revista (72)

Garcia H.; Ossorio O.G.; Dueñas S.; Castan H. Current and Voltage Control of Intermediate States in Bipolar Rram Devices for Neuristor Applications . ECS Transactions 2020; 97(1): 17-2.
Enlace a la publicaciónTexto completo en acceso abierto
Ver Todos

Libros (1)

García, Héctor; Ossorio, Óscar G.; Dueñas, Salvador; Castán, Helena. Using current pulses to control the intermediate conductance states in hafnium oxide-based RRAM devices. IEEE; 2020.
Enlace a la publicación
Ver Todos

Capítulos de libros (25)

Castán, H.; Dueñas, S.; Sardiña, A.; García García, Héctor; et al. RRAM memories with ALD high-k dielectrics: electrical characterization and analytical modelling.. En: VV.AA. Thin Film Processes - Artifacts on Surface Phenomena and Technological Facets. Intech; 2017. p. 165-178.
Enlace a la publicación
Ver Todos
 

AYUDA A LA INVESTIGACIÓN

Proyectos (7)

FABRICACIÓN, CARACTERIZACIÓN, SIMULACIÓN, MODELADO Y APLICACIONES DE DISPOSITIVOS DE CONMUTACIÓN RESISTIVA.. CASTAN LANASPA, MARIA HELENA (IP); DUEÑAS CARAZO, SALVADOR (IP); GARCIA GARCIA, HECTOR; SAHELICES FERNANDEZ, BENJAMIN. TEC2017-84321-C4-2-R. FONDOS FEDER, MINISTERIO DE ECONOMIA Y COMPETITIVIDAD , UNIVERSIDAD DE VALLADOLID (UVa) 2018-2021
Ver Todos
 

OTROS

Tesis doctorales (1)

PEREZ DIEZ, EDUARDO CARACTERIZACIÓN DE DEFECTOS EN MATERIALES SEMICONDUCTORES. APLICACIÓN AL ESTUDIO DE NUEVOS SUSTRATOS DE SILICIO PARA CÉLULAS SOLARES. Universidad de Valladolid; 2014.
Texto completo en acceso abierto  
Ver Todos

Congresos (6)

ECS Transactions, Montreal 10/05/2020 - 14/05/2020
(Ponencia). Garcia H.; Ossorio O.G.; Dueñas S.; Castan H. ECS Transactions
Ver Todos
Cargando información ...
Universidad de Valladolid - Copyright Universidad de Valladolid - Todos los derechos reservados